Fabrication and characterization of ZnO/AI/ZnO multilayers by simultaneous DC and RF magnetron sputtering

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DC Field	Value	Language
dc.contributor.author	Nagaraja, K.K.
dc.contributor.author	Kumar, A.S.
dc.contributor.author	Nagaraja, H.S.
dc.date.accessioned	2020-03-30T10:18:01Z	-
dc.date.available	2020-03-30T10:18:01Z	-
dc.date.issued	2015
dc.identifier.citation	IOP Conference Series: Materials Science and Engineering, 2015, Vol.73, 1, pp.-	en_US
dc.identifier.uri	http://idr.nitk.ac.in/jspui/handle/123456789/8037	-
dc.description.abstract	The present investigation reports the fabrication and characterization of multilayered transparent electrodes by simultaneous DC and RF magnetron sputtering on glass substrates. The multilayer structure consists of three layers (ZnO/Al/ZnO). The influence of Al layer thickness on the electrical and optical properties was investigated. Optimum thickness of Al was determined for high transmittance and good electrical conductivity. High quality films having resistance as low as 25 ?/sq with optical transmittance upto 65% were obtained at room temperature. � Published under licence by IOP Publishing Ltd.	en_US
dc.title	Fabrication and characterization of ZnO/AI/ZnO multilayers by simultaneous DC and RF magnetron sputtering	en_US
dc.type	Book chapter	en_US
Appears in Collections:	2. Conference Papers

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