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  3. 7. Patents Published
Please use this identifier to cite or link to this item: https://idr.l4.nitk.ac.in/jspui/handle/123456789/16964
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dc.contributor.authorMandal, Saumen-
dc.contributor.authorGupta, Bikesh-
dc.contributor.authorPujar, Pavan-
dc.contributor.authorHadagalli, Komalakrishna-
dc.contributor.authorVivek V, Robbi-
dc.date.accessioned2022-01-15T06:45:25Z-
dc.date.available2022-01-15T06:45:25Z-
dc.date.issued2018-08-17-
dc.identifier.urihttp://idr.nitk.ac.in/jspui/handle/123456789/16964-
dc.descriptionPatent Published Date: 17.08.2018en_US
dc.language.isoenen_US
dc.publisherIndian Patent Office, Chennaien_US
dc.relation.ispartofseries201741005384;-
dc.subjectFabrication of high conductive metallic filmsen_US
dc.subjectLow temperatureen_US
dc.titleFabrication of high conductive metallic films at low temperatureen_US
dc.typeOtheren_US
Appears in Collections:7. Patents Published

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